This year I was granted with an opportunity to study for my Master degree in Heriot Watt University in Edinburgh, UK. My master programme is called MSc Smart Systems Integration.
Last week I had an opportunity of laboratory work at a clean room. I was very excited about it as it was my first time I entered the clean room.
The lab was about photolithography. We were given a glass wafer coated with a Ti thin layer and we had to fabricate a microstructure test pattern from SU -8 photoresist.
Now finally I had a chance to actually do myself the photoresist spin coating, masking, baking and developing. Well, I am quite happy about it!!!
Spin coating is not that hard process. SU-8 is quite viscous and it is hard to get it out from the pipette and drop it onto the centre of the glass wafer. But I mastered this step quite easily.
After the SU-8 spread uniformly on glass wafer, I baked it at 65 C and 95 C.
The mask was just placed in contact with the glass wafer and with the help of UV light, I obtained a pattern on the wafer.
The development with the EC solvent and isoproponol was also quite easy. I just had to add the solvents onto the wafer and to wait until I got a structure.
I very enjoyed the whole process. I also found it quite easy.
I am happy that I could finally do the photolithography and not just listen to lectures about what photolithography is!
Last week I had an opportunity of laboratory work at a clean room. I was very excited about it as it was my first time I entered the clean room.
The lab was about photolithography. We were given a glass wafer coated with a Ti thin layer and we had to fabricate a microstructure test pattern from SU -8 photoresist.
Now finally I had a chance to actually do myself the photoresist spin coating, masking, baking and developing. Well, I am quite happy about it!!!
Spin coating is not that hard process. SU-8 is quite viscous and it is hard to get it out from the pipette and drop it onto the centre of the glass wafer. But I mastered this step quite easily.
After the SU-8 spread uniformly on glass wafer, I baked it at 65 C and 95 C.
The mask was just placed in contact with the glass wafer and with the help of UV light, I obtained a pattern on the wafer.
The development with the EC solvent and isoproponol was also quite easy. I just had to add the solvents onto the wafer and to wait until I got a structure.
I very enjoyed the whole process. I also found it quite easy.
I am happy that I could finally do the photolithography and not just listen to lectures about what photolithography is!
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